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Microline 300
• The MicroLine® series of non-contact critical dimensional measurement systems are ideal for semiconductor and MEMS applications.
• MicroLine critical dimension measurement systems are designed specifically for semiconductor and MEMs wafer and photomask CD metrology. MicroLine systems automatically measure linewidth, overlay registration, and other critical features.
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| Technical Specifications | □Standard ■Optional | |||||
| X Y Z | ||||||
| Stage Travel | 200x200x25mm | |||||
| Stage Type | Crossed-roller with manual co-axial positioning and quick-release | |||||
| Measurement Accuracy in the Field 01 View | 0.010 μm (with 100x objective lens) | |||||
| Feature Size | 0.5 μm - 400 μm within the field of view | |||||
| FOV Measurement Repeatability | < 0.010 μm (1σ) on walers (with 100x objective lens) | |||||
| < 0.005 μm (1σ) on photomasks (with 100x objective lens) | ||||||
| Optics* — Typical Set-Up | ■ | □ | ■ | ■ | □ | |
| Objective Lens | 5x | 10x | 20x | 50x | 100x | |
| Pixel Size (mm) | 0.00298 | 0.00142 | 0.00072 | 0.000296 | 0.000143 | |
| Working Distance (mm) | 23.5 | 17.5 | 4.5 | 1 | 1 | |
| Field of | X | 1.92 | 0.958 | 0.48 | 0.193 | 0.096 |
| View (mm) | Y | 1.29 | 0.644 | 0.318 | 0.131 | 0.065 |
| *Otheropticalconfigurationsavailable | ||||||
| Illumination | □ Quartz-halogen， reflected light | |||||
| ■ Transmilted iIIumination and color filters | ||||||
| □ Auloilluminalion | ||||||
| Facilities Requirements | 110V,1φ,60 Hz or 220V,1φ,50 Hz | |||||
| Features and Accessories | ||||||
| Software | □ MMWin™ and Measurement Conlrol Language (MCL) included | |||||
| Operating System | □ Microsoft Windows™ xp | |||||
| Autolocus | □ Vision-based | |||||
| Accessories | □ Low-noise CCD VGA format camera | |||||
| □ Image processing at 60 frames per second | ||||||
| ■ Vibration isolation table | ||||||
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